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SEM Image of ZnO Nanowires

SEM Image of ZnO Nanowires

AFM Image of Brass Nanoparticles

AFM Image of Brass Nanoparticles

Pulse Laser Deposition (PLD)

PLD is a method of depositing thin films of material on a substrate using high power, ultrashort laser pulses inside a vacuum chamber. The laser vaporizes the target material, which then deposits as a film of amorphous, polycrystalline, or crystalline material on a substrate such as silicon or gallium arsenide. This technology has a wide variety of applications in advanced materials development, including:

  • IBAD (ion-beam assisted deposition)
  • ITEX (ion texturing)
  • High Temperature Superconductivity
  • Diamond-like carbon
  • Photovoltaic (SI, InN)
  • Battery electrodes (LI, Cu-Sn)
  • Catalysts
  • Laser material interactionn generates atomic/ionic vapor from solid target
  • Vapor collected on heated substrate
  • Deposition of amorphous, polycrystalline, or crystalline thin films
  • Fabrication of nanoparticles, nanowires